Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors-Reference-Cited by-同舟云学术

Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

Published:2018 Issue:35 Volume:6 Page:9537-9544
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Murtaza Ghulam¹²³⁴⁵,Venkateswaran Sai P.⁶⁷⁸,Thomas Andrew G.⁹²³⁴,O'Brien Paul¹²³⁴⁵^ORCID,Lewis David J.⁵²³⁴⁹^ORCID

Affiliation:

1. School of Chemistry

2. University of Manchester

3. Manchester M13 9PL

4. UK

5. International Centre for Advanced Materials (ICAM, Manchester Hub)

6. BP America, Incorporated

7. Houston

8. USA

9. School of Materials

Abstract

Polycrystalline thin films of chromium doped tungsten disulphide (WS₂) have been deposited onto glass and steel substrates by Aerosol-Assisted Chemical Vapour Deposition (AACVD) at 450 °C.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2018/TC/C8TC01991F

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