Superior nanopatterns via adjustable nanoimprint lithography on aluminum oxide in high-K thin films with ultraviolet curable polymer

Author:

Oh Jin Young1,Kim Eun-Mi2,Heo Gi-Seok2,Kim Dong Hyun1,Lee DongWook1,Jeong Hae-Chang3,Seo Dae-Shik1

Affiliation:

1. IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering, Yonsei University, 134 Shinchon-Dong, Seodaemun-gu, Seoul 120-749, Republic of Korea

2. National Center for Nanoprocess and Equipment, Korea Institute of Industrial Technology, 6 Cheomdangwagi-ro 208beon-gil, Buk-gu, Gwangju 500-480, South Korea

3. Electrical Engineering, Changwon National University, 20 changwondaehak-ro, Unichang-gu, Changwon, Gyeonnam, 51140, Korea

Abstract

The present study substantiate that ultraviolet-nanoimprint lithography (UV-NIL) can be used to transfer a one-dimensional nano-pattern onto a high-k thin film of aluminum oxide mixed with a UV photocuring agent.

Funder

National Research Foundation of Korea

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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