Wafer-scale pulsed laser deposition of ITO for solar cells: reduced damage <i>vs.</i> interfacial resistance-Reference-Cited by-同舟云学术

Wafer-scale pulsed laser deposition of ITO for solar cells: reduced damage vs. interfacial resistance

Published:2022 Issue:8 Volume:3 Page:3469-3478
ISSN:2633-5409
Container-title:Materials Advances
language:en
Short-container-title:Mater. Adv.

Author:

Smirnov Yury¹,Repecaud Pierre-Alexis¹,Tutsch Leonard²,Florea Ileana³,Zanoni Kassio P.S.⁴,Paliwal Abhyuday⁴,Bolink Henk J.⁴^ORCID,i Cabarrocas Pere Roca⁴,Bivour Martin²,Morales-Masis Monica¹^ORCID

Affiliation:

1. MESA+ Institute for Nanotechnology, University of Twente, Enschede, AE 7500, Netherlands

2. Fraunhofer Institute for Solar Energy Systems ISE, 79110 Freiburg, Germany

3. LPICM, ÉCole Polytechnique, CNRS, Institut Polytechnique de Paris, Palaiseau 91120, France

4. Instituto de Ciencia Molecular, Universidad de Valencia, C/Catedrático J. Beltrán 2, 46980 Paterna, Spain

Abstract

Halide perovskite and silicon heterojunction solar cells present sensitive contact layers prone to damage during ITO deposition. We study the effect of ITO pulsed laser deposition pressure on damage mitigation and improved solar cell performance.

Funder

Agence Nationale de la Recherche

Ministerio de Ciencia e Innovación

Bundesministerium für Wirtschaft und Energie

Rijksdienst voor Ondernemend Nederland

King Abdullah University of Science and Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Chemistry (miscellaneous)

Link

http://pubs.rsc.org/en/content/articlepdf/2022/MA/D1MA01225H