Vapour–liquid–solid-like growth of high-quality and uniform 3C–SiC heteroepitaxial films on α-Al2O3(0001) substrates-Reference-Cited by-同舟云学术

Vapour–liquid–solid-like growth of high-quality and uniform 3C–SiC heteroepitaxial films on α-Al2O3(0001) substrates

Published:2021 Issue:8 Volume:23 Page:1709-1717
ISSN:1466-8033
Container-title:CrystEngComm
language:en
Short-container-title:CrystEngComm

Author:

Sannodo Naoki¹²³⁴^ORCID,Osumi Asuka¹²³⁴,Kaminaga Kenichi¹²³⁴^ORCID,Maruyama Shingo¹²³⁴^ORCID,Matsumoto Yuji¹²³⁴

Affiliation:

1. Department of Applied Chemistry

2. Tohoku University

3. Sendai

4. Japan

Abstract

We employ our pulsed laser deposition system with rapid beam deflection to demonstrate the heteroepitaxial growth of 3C–SiC thin films by a vapour–liquid–solid-like mechanism by alternating deposition of SiC and NiSi₂ flux in nanoscale.

Funder

Advanced Low Carbon Technology Research and Development Program

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/CE/D0CE01793K

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