Wafer-scale nanostructured black silicon with morphology engineering <i>via</i> advanced Sn-assisted dry etching for sensing and solar cell applications-Reference-Cited by-同舟云学术

Wafer-scale nanostructured black silicon with morphology engineering via advanced Sn-assisted dry etching for sensing and solar cell applications

Published:2023 Issue:10 Volume:15 Page:4843-4851
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Wu Shaoteng¹²^ORCID,Chen Qimiao¹^ORCID,Zhang Lin¹,Ren Huixue²,Zhou Hao¹,Hu Liangxing¹^ORCID,Tan Chuan Seng¹³

Affiliation:

1. School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798

2. State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, P.R. China

3. Institute of Microelectronics, A*STAR, 117685, Singapore

Abstract

Herein, we develop and present a novel CMOS-compatible non-lithography technique to fabricate wafer-scale (6 inches), random textured b-Si with morphology engineering.

Funder

National Research Foundation Singapore

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2023/NR/D2NR06493F

Reference43 articles.

1. Silicon Photonics

2. Black silicon: fabrication methods, properties and solar energy applications

3. Sub-50-nm self-assembled nanotextures for enhanced broadband antireflection in silicon solar cells

4. Wide-band “black silicon” based on porous silicon

5. Nanostructured black silicon and the optical reflectance of graded-density surfaces

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