Abnormal diffusion behaviors of Cu atoms in van der Waals layered material MoS2-Reference-Cited by-同舟云学术

Abnormal diffusion behaviors of Cu atoms in van der Waals layered material MoS2

Published:2019 Issue:20 Volume:7 Page:6052-6058
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Zhang Cai-Xin¹²³⁴⁵,Li Qianze¹²³⁴⁵,Tang Li-Ming¹²³⁴⁵,Yang Kaike⁶⁷⁸⁹⁵,Xiao Jin⁶⁷⁸⁹⁵^ORCID,Chen Ke-Qiu¹²³⁴⁵^ORCID,Deng Hui-Xiong⁶⁷⁸⁹⁵

Affiliation:

1. Department of Applied Physics

2. School of Physics and Electronics

3. Hunan University

4. Changsha 410082

5. China

6. State Key Laboratory of Superlattices and Microstructures

7. Institute of Semiconductors

8. Chinese Academy of Sciences

9. Beijing 100083

Abstract

We investigated the diffusion properties of metal atoms in van der Waals layered materials using first-principles calculations combined with group theory analysis. We found that the diffusion rate of Cu in bulk MoS₂ is much faster than other investigated metal atoms, whereas the diffusion rate of Cu in monolayer MoS₂ is the slowest one among investigated systems.

Funder

National Natural Science Foundation of China

Youth Innovation Promotion Association of the Chinese Academy of Sciences

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/TC/C9TC01626K

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1. Real-time imaging of adatom-promoted graphene growth on nickel

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