A growth mechanism for graphene deposited on polycrystalline Co film by plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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A growth mechanism for graphene deposited on polycrystalline Co film by plasma enhanced chemical vapor deposition

Published:2013 Issue:5 Volume:37 Page:1616
ISSN:1144-0546
Container-title:New Journal of Chemistry
language:en
Short-container-title:New J. Chem.

Author:

Wang Shumin,Qiao Liang,Zhao Cuimei,Zhang Xiaoming,Chen Jianli,Tian Hongwei,Zheng Weitao,Han Zhengbo

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry,Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2013/NJ/C3NJ41136B

Reference50 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2. The rise of graphene

3. Experimental observation of the quantum Hall effect and Berry's phase in graphene

4. Large-scale pattern growth of graphene films for stretchable transparent electrodes

5. Graphene: Status and Prospects

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