Block copolymer multiple patterning integrated with conventional ArFlithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Block copolymer multiple patterning integrated with conventional ArFlithography

Published:2010 Issue:1 Volume:6 Page:120-125
ISSN:1744-683X
Container-title:Soft Matter
language:en
Short-container-title:Soft Matter

Author:

Park Seung Hak,Shin Dong Ok,Kim Bong Hoon,Yoon Dong Ki,Kim Kyoungseon,Lee Si Yong,Oh Seok-Hwan,Choi Seong-Woon,Jeon Sang Chul,Kim Sang Ouk

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2010/SM/B913853F

Reference36 articles.

1. International Technology Roadmap for Semiconductors, 2007 (www.itrs.net)

2. The end of CMOS scaling

3. The Future of Lithography: SEMATECH Litho Forum 2008

4. Mask data volume: explosion or damp squib?

Cited by 67 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent advances in micro- and bio- electromechanical system architectures for energy efficient chemiresistors;Microelectronic Engineering;2024-05

2. A triboelectric nanogenerator with synergistic complementary nanopatterns fabricated by block copolymer self-assembly;Journal of Materials Chemistry A;2024

3. Developing Anisotropy in Self‐Assembled Block Copolymers: Methods, Properties, and Applications;Macromolecular Rapid Communications;2021-07-17

4. Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography;Advanced Materials;2020-04-03

5. Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments;Quantum Beam Science;2020-03-27

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3