Carbon quantum dots-embedded reduced graphene oxide compact films for highly pressure-tolerant electrodes-Reference-Cited by-同舟云学术

Carbon quantum dots-embedded reduced graphene oxide compact films for highly pressure-tolerant electrodes

Published:2024 Issue:31 Volume:12 Page:19885-19890
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Lin Dou¹²,Zhou Ziyan¹²,Shi Ronghao³,Chen Bin¹²^ORCID,Huang Zhulin¹²^ORCID,Tang Haibin¹²^ORCID,Wang Jun⁴,Zhu Xiaoguang¹,Shao Cheng¹,Han Fangming¹²^ORCID

Affiliation:

1. Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanostructures, Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences, Hefei, 230031, P. R. China

2. University of Science and Technology of China, Hefei, 230026, P. R. China

3. Henan Key Laboratory of Advanced Conductor Materials, Institute of Materials, Henan Academy of Sciences, Zhengzhou 450046, P. R. China

4. State Key Laboratory of Nonlinear Mechanics, Institute of Mechanics, Chinese Academy of Sciences, Beijing 100190, P. R. China

Abstract

Uniform CQD-embedded rGO films were made through hydrothermal reaction and vacuum filtration. CQDs boost ion transport and compressive strength. Remarkably, the films retain 81.2% capacitance under ultrahigh pressure (360 MPa).

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/TA/D4TA03719G

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