Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 Å) inorganic coatings-Reference-Cited by-同舟云学术

Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 Å) inorganic coatings

Published:2014-08-29 Issue:41 Volume:2 Page:17371-17379
ISSN:2050-7488
Container-title:J. Mater. Chem. A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Atanasov Sarah E.,Oldham Christopher J.,Slusarski Kyle A.,Taggart-Scarff Joshua,Sherman Shalli A.,Senecal Kris J.,Filocamo Shaun F.,McAllister Quinn P.,Wetzel Eric D.,Parsons Gregory N.

Funder

U.S. Army Research Laboratory

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/TA/C4TA03662J

Reference33 articles.

1. Microfibre–nanowire hybrid structure for energy scavenging

2. Physicochemical properties of kevlar 49 fiber

3. Compressional behaviour of Kevlar fibres

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