Calibration-free quantitative analysis of thin-film oxide layers in semiconductors using laser induced breakdown spectroscopy (LIBS)-Reference-Cited by-同舟云学术

Calibration-free quantitative analysis of thin-film oxide layers in semiconductors using laser induced breakdown spectroscopy (LIBS)

Published:2017 Issue:7 Volume:32 Page:1378-1387
ISSN:0267-9477
Container-title:Journal of Analytical Atomic Spectrometry
language:en
Short-container-title:J. Anal. At. Spectrom.

Author:

Davari Seyyed Ali¹²³⁴⁵,Hu Sheng⁶²³⁴⁵,Pamu Ravi¹²³⁴⁵,Mukherjee Dibyendu¹²³⁴⁵^ORCID

Affiliation:

1. Department of Mechanical, Aerospace, & Biomedical Engineering

2. University of Tennessee

3. Knoxville

4. USA

5. Nano-BioMaterials Laboratory for Energy, Energetics & Environment (nbml-E3)

6. Department of Chemical & Biomolecular Engineering

Abstract

Calibration-free LIBS for quantitative analysis of thin film layers for metal oxide semiconductor (MOS) applications.

Publisher

Royal Society of Chemistry (RSC)

Subject

Spectroscopy,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2017/JA/C7JA00083A

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