Pulsed-light surface annealing for low contact resistance interfaces between metal electrodes and bismuth telluride thermoelectric materials-Reference-Cited by-同舟云学术

Pulsed-light surface annealing for low contact resistance interfaces between metal electrodes and bismuth telluride thermoelectric materials

Published:2019 Issue:3 Volume:7 Page:479-483
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Joshi Giri¹²³⁴^ORCID,Mitchell Dan¹²³⁴,Ruedin Josh¹²³⁴,Hoover Kyle¹²³⁴,Guzman Rey¹²³⁴,McAleer Mike¹²³⁴,Wood Leslie¹²³⁴,Savoy Steve¹²³⁴

Affiliation:

1. Nanohmics, Inc., 6201 E. Oltorf Street

2. Suite 400

3. Austin

4. USA

Abstract

The pulsed light annealing process improves the efficiency of bismuth telluride based thermoelectric devices by reducing the contact resistance significantly.

Funder

U.S. Navy

Jet Propulsion Laboratory

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/TC/C8TC03147A

Reference20 articles.

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3. K. Matsubara and M.Matsuura , A thermoelectric application to vehicles , in CRC Handbook of Thermoelectrics , ed. D. M. Rowe , Taylor & Francis Group , Boca Raton , 2006

4. A large volume, portable, real-time PCR reactor

5. Recent Studies of Bismuth Telluride and Its Alloys

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