Identification and classification of particle contaminants on photomasks based on individual-particle Raman scattering spectra and SEM images-Reference-Cited by-同舟云学术

Identification and classification of particle contaminants on photomasks based on individual-particle Raman scattering spectra and SEM images

Published:2022 Issue:51 Volume:12 Page:33349-33357
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Li Dongxian¹²³,Zhang Tao¹,Yue Weisheng¹,Gao Ping¹,Luo Yunfei¹,Wang Changtao¹,Luo Xiangang¹³^ORCID

Affiliation:

1. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China

2. School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, P.O. Box 350, Chengdu 610209, China

3. School of Optoelectronics, University of Chinese Academy of Sciences, Beijing 100049, China

Abstract

Raman spectroscopy was used for the detection chemical composition of particle contamination on photomasks. Particle types and sources were identified and classified according to the Raman spectra of individual particles.

Funder

National Natural Science Foundation of China

Youth Innovation Promotion Association of the Chinese Academy of Sciences

Sichuan Province Science and Technology Support Program

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/RA/D2RA05672K

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