Self-textured ZnO <i>via</i> AACVD of alkyl alkoxides: a solution-based seed-less route towards optoelectronic-grade coatings-Reference-Cited by-同舟云学术

Self-textured ZnO via AACVD of alkyl alkoxides: a solution-based seed-less route towards optoelectronic-grade coatings

Published:2023 Issue:17 Volume:4 Page:3774-3786
ISSN:2633-5409
Container-title:Materials Advances
language:en
Short-container-title:Mater. Adv.

Author:

Sanchez-Perez Clara¹²^ORCID,Srimurugananthan Sriluxmi¹,Sotelo-Vazquez Carlos³^ORCID,Sathasivam Sanjayan¹⁴^ORCID,Wang Mingyue¹,Marugán Javier³,Parkin Ivan P.¹^ORCID,Carmalt Claire J.¹^ORCID

Affiliation:

1. University College London, Department of Chemistry, 20 Gordon St, London WC1H 0AJ, UK

2. Instituto de Energía Solar, Universidad Politécnica de Madrid, 28040 Madrid, Spain

3. Department of Chemical and Environmental Technology (ESCET), Universidad Rey Juan Carlos, C/Tulipán s/n, Móstoles, 28933 Madrid, Spain

4. School of Engineering, London South Bank University, London, SE1 0AA, UK

Abstract

Carbon-free, crystalline and transparent (002)-oriented ZnO films with thickness below 200 nm were deposited at 350 °C on plain glass via AACVD. ZnO films restricted to PVD-growth are achievable through a fast, cost-effective and scalable methodology.

Funder

Engineering and Physical Sciences Research Council

Comunidad de Madrid

EPSRC Centre for Doctoral Training in Technology Enhanced Chemical Synthesis

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Chemistry (miscellaneous)

Link

http://pubs.rsc.org/en/content/articlepdf/2023/MA/D3MA00468F

Reference71 articles.

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