Facile chemical solution deposition of nanocrystalline CrN thin films with low magnetoresistance-Reference-Cited by-同舟云学术

Facile chemical solution deposition of nanocrystalline CrN thin films with low magnetoresistance

Published:2014 Issue:24 Volume:4 Page:12568-12571
ISSN:2046-2069
Container-title:RSC Adv.
language:en
Short-container-title:RSC Adv.

Author:

Hui Zhenzhen¹²³⁴,Tang Xianwu¹²³⁴,Wei Renhuai¹²³⁴,Hu Ling¹²³⁴,Yang Jie¹²³⁴,Luo Hongmei⁵⁶⁷,Dai Jianming¹²³⁴,Song Wenhai¹²³⁴,Liu Xingzhao⁸⁹¹⁰,Zhu Xuebin¹²³⁴,Sun Yuping¹²³⁴¹¹

Affiliation:

1. Key Laboratory of Materials Physics

2. Institute of Solid State Physics

3. Chinese Academy of Sciences

4. Hefei 230031, P. R. China

5. Department of Chemical Engineering

6. New Mexico State University

7. Las Cruces, USA

8. State Key Laboratory of Electronic Thin Films and Integrated Devices

9. University of Electronic Science and Technology of China

10. Chengdu 610054, P. R. China

11. High Magnetic Field Laboratory

Abstract

Polycrystalline CrN thin films were first prepared by a facile chemical solution deposition method.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/RA/C4RA00263F

Reference32 articles.

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2. Mesoporous Chromium Nitride as High Performance Catalyst Support for Methanol Electrooxidation

3. Organic Monolayers from 1-Alkynes Covalently Attached to Chromium Nitride: Alkyl and Fluoroalkyl Termination

4. Epitaxial suppression of the metal-insulator transition in CrN

5. Electrical Properties of Cr–N Films Deposited by Sputtering: Application to Cryogenic Temperature Sensors

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