Optimisation of bi-layer resist overhang structure formation and SiO2 sputter-deposition process for fabrication of gold multi-electrode array-Reference-Cited by-同舟云学术

Optimisation of bi-layer resist overhang structure formation and SiO2 sputter-deposition process for fabrication of gold multi-electrode array

Published:2015 Issue:9 Volume:5 Page:6675-6681
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Kim Y. H.¹²³⁴,Kim G. H.¹²³⁴,Kim A.-Y.¹²³⁴,Baek N. S.¹²³⁴,Jeong J. I.¹²³⁴,Han Y. H.¹²³⁴,Shin B. C.⁵⁶⁷⁴,Chung M.-A.¹²³⁴,Jung S.-D.¹²³⁴

Affiliation:

1. Electronics and Telecommunications Research Institute

2. Synapse Device Creative Research Centre

3. Daejeon

4. South Korea

5. Pusan National University

6. Department of Rehabilitation Medicine

7. Yangsan

Abstract

In this paper we report the results on the optimization of the bi-layer lift-off resist (LOR) SiO₂ sputter-deposition technique which is ideal for obtaining damage-free multi-electrode array (MEA).

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C4RA11746H

Reference34 articles.

1. The fabrication of low-impedance nanoporous gold multiple-electrode arrays for neural electrophysiology studies

2. Development of a microelectrode array sensing platform for combination electrochemical and spectrochemical aqueous ion testing

3. A PDMS-Based Conical-Well Microelectrode Array for Surface Stimulation and Recording of Neural Tissues

4. Characterization of surface modification on microelectrode arrays for in vitro cell culture

5. A novel organotypic long-term culture of the rat hippocampus on substrate-integrated multielectrode arrays

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