Low temperature UV cross-linked fluorinated polyurethane for organic thin film transistors

Author:

Duan Ruixia1ORCID,Liu Sixu1,Liu Xuying1ORCID,Huang Miaoming1,He Suqin12,Liu Hao1,Liu Wentao1ORCID,Zhu Chengshen1

Affiliation:

1. School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450001, China

2. Henan Key Laboratory of Advanced Nylon Materials and Application, Zhengzhou University, Zhengzhou, 450001, China

Abstract

A FPU dielectric can be cured quickly at low temperature by UV cross-linking, for use in flexible devices; it is suitable for large-area preparation by a solution method and has good solvent resistance. OTFTs with FPU perform better than those with a PU dielectric.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

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