Local reactivity of metal–insulator–semiconductor photoanodes imaged by photoinduced electrochemiluminescence microscopy-Reference-Cited by-同舟云学术

Local reactivity of metal–insulator–semiconductor photoanodes imaged by photoinduced electrochemiluminescence microscopy

Published:2023 Issue:82 Volume:59 Page:12262-12265
ISSN:1359-7345
Container-title:Chemical Communications
language:en
Short-container-title:Chem. Commun.

Author:

Descamps Julie¹,Zhao Yiran²^ORCID,Le-Pouliquen Julie³,Goudeau Bertrand¹,Garrigue Patrick¹,Tavernier Karine³,Léger Yoan³,Loget Gabriel²⁴^ORCID,Sojic Neso¹^ORCID

Affiliation:

1. University of Bordeaux, Bordeaux INP, ISM, UMR CNRS 5255, Pessac 33607, France

2. Univ Rennes, CNRS, ISCR (Institut des Sciences Chimiques de Rennes)-UMR6226, Rennes F-35000, France

3. Univ Rennes, INSA Rennes, CNRS, Institut FOTON-UMR 6082, F-35000, Rennes, France

4. Institute of Energy and Climate Research, Fundamental Electrochemistry (IEK-9), Forschungszentrum Jülich GmbH, Jülich, 52425, Germany

Abstract

Photoinduced electrochemiluminescence precisely imaged the hole-driven heterogeneous photoelectrochemical reactivity of n-Si/SiOx photoanodes patterned with Ir microbands.

Funder

Agence Nationale de la Recherche

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,General Chemistry,Ceramics and Composites,Electronic, Optical and Magnetic Materials,Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2023/CC/D3CC03702A

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