Humic acid removal by gas–liquid interface discharge plasma: performance, mechanism and comparison to ozonation-Reference-Cited by-同舟云学术

Humic acid removal by gas–liquid interface discharge plasma: performance, mechanism and comparison to ozonation

Published:2019 Issue:1 Volume:5 Page:152-160
ISSN:2053-1400
Container-title:Environmental Science: Water Research & Technology
language:en
Short-container-title:Environ. Sci.: Water Res. Technol.

Author:

Cui Yanyan¹²³⁴⁵,Yu Jianwei¹²³⁴⁶^ORCID,Su Ming¹²³⁴⁶,Jia Zeyu¹²³⁴⁶,Liu Tingting¹²³⁴⁶,Oinuma Gaku⁷⁸⁹,Yamauchi Tokiko⁷⁸⁹

Affiliation:

1. Key Laboratory of Drinking Water Science and Technology

2. Research Center for Eco-Environmental Sciences, Chinese Academy of Sciences

3. Beijing 100085

4. China

5. China university of Mining & Technology

6. University of Chinese Academy of Sciences

7. Advanced Technology R&D Center

8. Mitsubishi Electric Corporation

9. Japan

Abstract

A novel advanced oxidation process (AOP) based on plasma in gas–liquid interface discharge was evaluated for humic acid removal. Much better performance was obtained compared to ozonation. The OH˙ radicals generated by reaction of in situ produced ozone and H₂O₂ during discharge process were mainly responsible for the removal.

Funder

New Energy and Industrial Technology Development Organization

National Natural Science Foundation of China

Major Science and Technology Program for Water Pollution Control and Treatment

Publisher

Royal Society of Chemistry (RSC)

Subject

Water Science and Technology,Environmental Engineering

Link

http://pubs.rsc.org/en/content/articlepdf/2019/EW/C8EW00520F

Reference43 articles.

1. Removal of natural organic matter from potential drinking water sources by combined coagulation and adsorption using carbon nanomaterials