Nanoscale phase separation in the oxide layer at GeTe (111) surfaces

Author:

Frolov Alexander S.12ORCID,Callaert Carolien3,Batuk Maria3ORCID,Hadermann Joke3ORCID,Volykhov Andrey A.14,Sirotina Anna P.25,Amati Matteo6,Gregoratti Luca6,Yashina Lada V.12ORCID

Affiliation:

1. Department of Chemistry, Lomonosov Moscow State University, Leninskie Gory 1/3, 119991 Moscow, Russia

2. N.N. Semenov Federal Research Center for Chemical Physics, Kosygina Street 4, 119991 Moscow, Russia

3. EMAT, Department of Physics, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium

4. Institute of General and Inorganic Chemistry RAS, Leninsky Avenue 31, 119991 Moscow, Russia

5. Institute of Nanotechnology of Microelectronics RAS, Nagatinskaya str., 16A/11, 115487 Moscow, Russia

6. Elettra - Sincrotrone Trieste S.C.p.A., Area Science Park, I-34012 Basovizza, Trieste, Italy

Abstract

As a semiconductor ferroelectric, GeTe has become a focus of renewed attention due to the recent discovery of giant Rashba splitting. For the future applications, the knowledge of growth kinetics and structure of oxide layer is of great importance.

Funder

Deutscher Akademischer Austauschdienst

Bijzonder Onderzoeksfonds

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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