Simultaneous heteroepitaxial growth of SrO (001) and SrO (111) during strontium-assisted deoxidation of the Si (001) surface

Author:

Jovanović Zoran12345ORCID,Gauquelin Nicolas6789,Koster Gertjan123410,Rubio-Zuazo Juan1112131415,Ghosez Philippe1617181920,Verbeeck Johan6789,Suvorov Danilo1234,Spreitzer Matjaž1234ORCID

Affiliation:

1. Advanced Materials Department

2. Jožef Stefan Institute

3. 1000 Ljubljana

4. Slovenia

5. Laboratory of Physics

6. Electron Microscopy for Materials Science (EMAT)

7. University of Antwerp

8. 2020 Antwerp

9. Belgium

10. Faculty of Science and Technology

11. SpLine

12. Spanish CRG BM25 Beamline at the ESRF (The European Synchrotron)

13. Grenoble

14. France

15. Instituto de Ciencia de Materiales de Madrid

16. Theoretical Materials Physics

17. Q-Mat

18. CESAM

19. Université de Liège

20. B-4000 Liège

Abstract

A 1 nm-thick layer of SrO deoxidizes the silicon surface and experiences structural ordering into SrO (001) and SrO (111) epitaxial islands.

Funder

Vlaamse regering

Ministarstvo Prosvete, Nauke i Tehnološkog Razvoja

Javna Agencija za Raziskovalno Dejavnost RS

Fonds Wetenschappelijk Onderzoek

Ministerio de Ciencia, Innovación y Universidades

Universiteit Antwerpen

F.R.S.-FNRS

Consejo Superior de Investigaciones Cientificas

University of Liège

Ministry of Education, Science and Sport

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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