Non-toxically enhanced sulfur reaction for formation of chalcogenide thin films using a thermal cracker-Reference-Cited by-同舟云学术

Non-toxically enhanced sulfur reaction for formation of chalcogenide thin films using a thermal cracker

Author:

Cho Dae-Hyung¹²,Lee Woo-Jung¹²,Park Sang-Woo³⁴⁵,Wi Jae-Hyung¹²,Han Won Seok¹²,Kim Jeha³⁴⁵,Cho Mann-Ho⁶⁷⁸,Kim Dongseop⁹¹⁰,Chung Yong-Duck¹²¹¹¹²

Affiliation:

1. Electronics Telecommunications Research Institute (ETRI)

2. Daejeon 305-700, Republic of Korea

3. Department of Solar & Energy Engineering

4. Cheongju University

5. Cheongju, Republic of Korea

6. Department of Physics and Applied Physics

7. Yonsei University

8. Seoul 120-749, Republic of Korea

9. Samsung SDI

10. Cheonan-si, Republic of Korea

11. Korea University of Science and Technology (UST)

12. Daejeon 305-350, Republic of Korea

Abstract

The proposed safe and cheap method for enhanced sulfur reaction enables the formation of high-quality chalcogenide thin films.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

Reference39 articles.

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献