Patterning Bi2Se3single-crystalline thin films on Si(111) substrates using strong oxidizing acids-Reference-Cited by-同舟云学术

Patterning Bi2Se3single-crystalline thin films on Si(111) substrates using strong oxidizing acids

Published:2017 Issue:51 Volume:7 Page:32294-32299
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Gao Lei¹²³⁴⁵^ORCID,Li Handong¹²³⁴⁵,Ren Wuyang⁶³⁴⁵,Wang Gaoyun¹²³⁴⁵,Li Hui¹²³⁴⁵,Zhou Zhihua¹²³⁴⁵,Ji Haining¹²³⁴⁵,Niu Xiaobin¹²³⁴⁵,Wang Zhiming⁶³⁴⁵

Affiliation:

1. State Key Laboratory of Electronic Thin Films and Integrated Devices

2. School of Microelectronics and Solid-State Electronics

3. University of Electronic Science and Technology of China

4. Chengdu 610054

5. China

6. Institute of Fundamental and Frontier Sciences

Abstract

Acidic potassium dichromate solutions (K₂Cr₂O₇–H₂SO₄and K₂Cr₂O₇–HCl) are applied for patterning single crystalline Bi₂Se₃thin films on Si(111) substrates.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2017/RA/C7RA05317G

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