Intense pulsed light for split-second structural development of nanomaterials-Reference-Cited by-同舟云学术

Intense pulsed light for split-second structural development of nanomaterials

Published:2017 Issue:29 Volume:5 Page:7142-7160
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Lim Ho Sun¹²³⁴,Kim Soo Jin⁵⁶⁷⁴⁸,Jang Ho Won⁵⁶⁷⁴^ORCID,Lim Jung Ah⁸⁹¹⁰¹¹⁴^ORCID

Affiliation:

1. Department of Chemical and Biological Engineering

2. Sookmyung Women's University

3. Seoul 04310

4. Korea

5. Department of Materials Science and Engineering

6. Seoul National University

7. Seoul 08826

8. Center for Opto-Electronic Materials and Devices

9. Post-silicon Semiconductor Research Institute

10. Korea Institute of Science and Technology (KIST)

11. Seoul 02792

Abstract

Intense pulsed light has been used as a split-second photonic technology for structural reformation and/or chemical modification of various nanomaterials.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2017/TC/C7TC01848G

Reference113 articles.

1. T. Gebel , L.Rebohle, R.Fendler, W.Hentsch, W.Skorupa, M.Voelskow, W.Anwand and R. A.Yankov, 14th International Conference on Advanced Thermal Processing of Semiconductors – RTP2006, 2006, 47–55

2. A review of thermal processing in the subsecond range: semiconductors and beyond

3. Treatment of a nonresponding port-wine stain with a new pulsed light source (PhotoDerm® VL)

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