Grain size reduction on nanostructured TiO2 thin films due to annealing
Author:
Affiliation:
1. Department of Physics
2. Beni-Suef University
3. Beni-Suef 62111
4. Egypt
Abstract
TiO2 thin films have been deposited at 300 °C on quartz substrates by a metal–organic chemical vapor deposition technique.
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2017/RA/C7RA00706J
Reference48 articles.
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