Development and utility of a new 3-D magnetron source for high rate deposition of highly conductive ITO thin films near room temperature
Author:
Affiliation:
1. Center for Advanced Plasma Surface Technology (CAPST)
2. NU-SKKU Joint Institute for Plasma Nano Materials
3. Department of Advanced Materials Science and Engineering
4. Sungkyunkwan University
5. Suwon 440-746
Abstract
This study reports the high rate and low-temperature deposition of high-quality ITO films using a new 3-D confined magnetron sputtering method.
Funder
Ministry of Science, ICT and Future Planning
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2018/CP/C7CP07318F
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