Environment-controlled sol–gel soft-NIL processing for optimized titania, alumina, silica and yttria-zirconia imprinting at sub-micron dimensions-Reference-Cited by-同舟云学术

Environment-controlled sol–gel soft-NIL processing for optimized titania, alumina, silica and yttria-zirconia imprinting at sub-micron dimensions

Author:

Bottein Thomas¹²³⁴⁵,Dalstein Olivier⁶⁷⁸⁹¹⁰,Putero Magali¹²³⁴⁵,Cattoni Andrea¹¹¹²¹³,Faustini Marco⁶⁷⁸⁹¹⁰,Abbarchi Marco¹²³⁴⁵,Grosso David¹²³⁴⁵^ORCID

Affiliation:

1. NOVA Team

2. Institut Matériaux Microélectronique et Nanosciences de Provence

3. (IM2NP) - UMR CNRS 7334

4. Aix-Marseille Université

5. Faculté des Sciences de Saint Jérôme

6. Sorbonne Universités

7. UPMC Univ Paris 06

8. CNRS

9. Collège de France

10. UMR 7574

11. Laboratoire de Photonique et de Nanostructures (LPN) - CNRS

12. 91460 Marcoussis

13. France

Abstract

Metal oxide (MO_X) surface nanopatterns can be prepared using Soft-Nano-Imprint-Lithography (soft-NIL) combined with sol–gel deposition processing.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

Reference40 articles.

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