Comparison of the plasmonic performances between lithographically fabricated and chemically grown gold nanorods
Author:
Affiliation:
1. Department of Physics
2. The Chinese University of Hong Kong
3. Hong Kong SAR
4. China
5. Beijing Computational Science Research Center
6. Beijing 100084
Abstract
The plasmonic performances of lithographic and chemical gold nanorods are quantitatively examined and compared through both experiments and electrodynamic simulations.
Funder
Research Grants Council, University Grants Committee, Hong Kong
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2015/CP/C5CP00715A
Reference50 articles.
1. Gold nanorods and their plasmonic properties
2. Plasmon-Controlled Fluorescence: Beyond the Intensity Enhancement
3. Plasmon-enhanced chemical reactions
4. Nanoshell-Enabled Photothermal Cancer Therapy: Impending Clinical Impact
5. Biosensing with plasmonic nanosensors
Cited by 45 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Plasmonic nanomaterials: noble metals and beyond;Plasmonic Materials and Metastructures;2024
2. Structural Color Boosted Electrochromic Devices: Strategies and Applications;Advanced Functional Materials;2023-12-12
3. 2D Assembly of Atomically Oriented Gold Nanodisks Leads to Tunable Plasmonic Resonance;The Journal of Physical Chemistry C;2023-04-10
4. Large‐Area Periodic Arrays of Atomically Flat Single‐Crystal Gold Nanotriangles Formed Directly on Substrate Surfaces;Small;2022-11-07
5. Chemo‐Phototherapy with Carfilzomib‐Encapsulated TiN Nanoshells Suppressing Tumor Growth and Lymphatic Metastasis;Small;2022-06-24
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3