Nanoridge patterns on polymeric film by a photodegradation copying method for metallic nanowire networks-Reference-Cited by-同舟云学术

Nanoridge patterns on polymeric film by a photodegradation copying method for metallic nanowire networks

Published:2018 Issue:71 Volume:8 Page:40740-40747
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Wang Jun¹²³⁴⁵,Zhang Shuye¹²³⁴^ORCID,Shi Zhiyuan¹²³⁴,Jiu Jinting⁵⁶⁷⁸,Wu Chunhui⁵⁶⁷⁸,Sugahara Tohru⁵⁶⁷⁸,Nagao Shijo⁵⁶⁷⁸,Suganuma Katsuaki⁵⁶⁷⁸,He Peng¹²³⁴^ORCID

Affiliation:

1. State Key Laboratory of Advanced Welding and Joining

2. Harbin Institute of Technology

3. Harbin 150001

4. China

5. The Institute of Scientific and Industrial Research

6. Osaka University

7. Ibaraki

8. Japan

Abstract

A simple photocopying method based on selective polymer photodegradation is proposed for fabricating topographical nanopatterns. Nanoridges are structured on a polyethylene terephthalate film due to ultraviolet shielding of silver nanowire networks.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2018/RA/C8RA02249F

Reference42 articles.

1. Micropatterning Alginate Substrates for In Vitro Cardiovascular Muscle on a Chip

2. SELF-ASSEMBLY OF GOLD NANORODS ON WRINKLED TEMPLATE

3. Harnessing Localized Ridges for High-Aspect-Ratio Hierarchical Patterns with Dynamic Tunability and Multifunctionality