The adsorption of silicon on an iridium surface ruling out silicene growth

Author:

Satta Mauro12345ORCID,Lacovig Paolo675ORCID,Apostol Nicoleta8910,Dalmiglio Matteo675,Orlando Fabrizio1112135,Bignardi Luca675ORCID,Bana Harsh1112135,Travaglia Elisabetta1112135,Baraldi Alessandro6751112ORCID,Lizzit Silvano675ORCID,Larciprete Rosanna14155ORCID

Affiliation:

1. CNR-Istituto per lo Studio dei Materiali Nanostrutturati (ISMN)

2. Department of Chemistry

3. Sapienza University

4. Roma

5. Italy

6. Elettra-Sincrotrone Trieste S.C.p.A.

7. 34149 Trieste

8. National Institute of Materials Physics

9. 077125 Magurele-Ilfov

10. Romania

11. Department of Physics

12. University of Trieste

13. 34127 Trieste

14. CNR-ISC Istitute for Complex Systems

15. 00185 Roma

Abstract

We followed the adsorption of Si on the Ir(111) surface via high resolution core level photoelectron spectroscopy, starting from the clean metal surface up to a coverage exceeding one monolayer.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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