Investigation on the interlayer coupling and bonding in layered nitride-halides ThNF and ThNCl-Reference-Cited by-同舟云学术

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Investigation on the interlayer coupling and bonding in layered nitride-halides ThNF and ThNCl

Published:2021 Issue:46 Volume:11 Page:28698-28703
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Liu Xiao¹²^ORCID,Liu Da-Yong¹^ORCID,Li Ting-Ting¹²^ORCID,Chen Dong-Meng³^ORCID,Zou Liang-Jian¹²^ORCID

Affiliation:

1. Key Laboratory of Materials Physics, Institute of Solid State Physics, HFIPS, Chinese Academy of Science, Hefei 230031, China

2. Science Island Branch of the Graduate School, University of Science and Technology of China, Hefei 230026, China

3. College of Science, China University of Petroleum, Qingdao 266580, China

Abstract

Showing that the interlayer charge transfer and chemical bond in ThNF and ThNCl are considerable larger than the van der Waals compound ZrNCl, addressing the difficulty in intercalating Li ion or other charged molecules.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/RA/D1RA05578J

Reference29 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2. Ultrasensitive photodetectors based on monolayer MoS2

3. Electronic structures of silicon nanoribbons

4. Superconductivity in two-dimensional CoO2 layers

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