The influence of hydrogen, nitrogen or oxygen additions to radiofrequency argon glow discharges for optical emission spectrometry-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The influence of hydrogen, nitrogen or oxygen additions to radiofrequency argon glow discharges for optical emission spectrometry

Published:2002 Issue:11 Volume:17 Page:1549-1555
ISSN:0267-9477
Container-title:J. Anal. At. Spectrom.
language:en
Short-container-title:J. Anal. At. Spectrom.

Author:

Fernández Beatriz,Bordel Nerea,Pérez Covadonga,Pereiro Rosario,Sanz-Medel Alfredo

Publisher

Royal Society of Chemistry (RSC)

Subject

Spectroscopy,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2002/JA/B207503B

Reference21 articles.

1. Radiofrequency powered glow discharges for emission and mass spectrometry: operating characteristics, figures of merit and future prospects

2. Glow discharge atomic emission spectrometry for the determination of chlorides and total organochlorine in water samplesviaon-line continuous generation of chlorine

3. Comparative study of the excitation/ionization capacity of direct current versus radiofrequency powered glow discharge optical spectrometry

4. Emission characteristics of mixed gas plasmas in low-pressure glow discharges

5. Evaluation of Alternative Plasma Gases for Radio-Frequency Glow Discharge Mass Spectrometry (rf GD-MS)

Cited by 39 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O2 plasma;Applied Surface Science;2022-04

2. A glow discharge time-of-flight mass spectrometry (GD-TOFMS) study of the ‘hydrogen effect’ using copper, iron and titanium cathodes;Journal of Analytical Atomic Spectrometry;2015

3. Effect of small quantities of oxygen in a neon glow discharge;J. Anal. At. Spectrom.;2014

4. Enhancement of analyte atomic lines with excitation energies of about 5 eV in the presence of molecular gases in analytical glow discharges;J. Anal. At. Spectrom.;2014

5. Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry;Analytica Chimica Acta;2012-02

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3