Interface engineering of the photoelectrochemical performance of Ni-oxide-coated n-Si photoanodes by atomic-layer deposition of ultrathin films of cobalt oxide-Reference-Cited by-同舟云学术

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Interface engineering of the photoelectrochemical performance of Ni-oxide-coated n-Si photoanodes by atomic-layer deposition of ultrathin films of cobalt oxide

Published:2015 Issue:9 Volume:8 Page:2644-2649
ISSN:1754-5692
Container-title:Energy & Environmental Science
language:en
Short-container-title:Energy Environ. Sci.

Author:

Zhou Xinghao¹²³⁴⁵,Liu Rui¹²³⁴,Sun Ke¹²³⁴⁶,Friedrich Dennis¹²³⁴⁷,McDowell Matthew T.¹²³⁴⁶,Yang Fan¹²³⁴⁶,Omelchenko Stefan T.¹²³⁴⁵,Saadi Fadl H.¹²³⁴⁵,Nielander Adam C.⁶²³⁴^ORCID,Yalamanchili Sisir¹²³⁴⁵,Papadantonakis Kimberly M.¹²³⁴⁶,Brunschwig Bruce S.¹²³⁴⁸,Lewis Nathan S.¹²³⁴⁶

Affiliation:

1. Joint Center for Artificial Photosynthesis

2. California Institute of Technology

3. Pasadena

4. USA

5. Department of Applied Physics & Materials Science

6. Division of Chemistry and Chemical Engineering

7. Institute for Solar Fuels

8. Beckman Institute and Molecular Materials Research Center

Abstract

Interfacial CoO_xlayers provide a route to stable, high-performance Si photoanodes for water splitting, without requiring np⁺homojunctions.

Funder

Gordon and Betty Moore Foundation

Office of Science

Publisher

Royal Society of Chemistry (RSC)

Subject

Pollution,Nuclear Energy and Engineering,Renewable Energy, Sustainability and the Environment,Environmental Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/EE/C5EE01687H

Reference45 articles.

1. Photoelectrolysis of water by irradiation of platinized n-type semiconducting metal oxides

2. Solar Water Splitting Cells

3. Semiconductor-Based Composite Materials: Preparation, Properties, and Performance

4. Semiconductor Electrodes: XLVI . Stabilization of n‐Silicon Electrodes in Aqueous Solution Photoelectrochemical Cells by Formation of Platinum Silicide Layers

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