Low temperature synthesis of silicon quantum dots with plasma chemistry control in dual frequency non-thermal plasmas-Reference-Cited by-同舟云学术

Low temperature synthesis of silicon quantum dots with plasma chemistry control in dual frequency non-thermal plasmas

Published:2016 Issue:23 Volume:18 Page:15697-15710
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Sahu Bibhuti Bhusan¹²³⁴⁵,Yin Yongyi¹²³⁴⁵,Han Jeon Geon¹²³⁴⁵,Shiratani Masaharu⁶⁷⁸⁹

Affiliation:

1. Center for Advanced Plasma Surface Technology (CAPST)

2. NU-SKKU Joint Institute for Plasma Nano Materials

3. Department of Advanced Materials Science and Engineering

4. Sungkyunkwan University

5. Suwon 440-746

6. Graduate School of Information Science and Electrical Engineering

7. Kyushu University

8. Fukuoka 819-0395

9. Japan

Abstract

The design of advanced plasma processes by plasma and radical control is essential for the controlled low-temperature deposition of different size QDs.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2016/CP/C6CP01856D

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