A tunable sub-100 nm silicon nanopore array with an AAO membrane mask: reducing unwanted surface etching by introducing a PMMA interlayer-Reference-Cited by-同舟云学术

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A tunable sub-100 nm silicon nanopore array with an AAO membrane mask: reducing unwanted surface etching by introducing a PMMA interlayer

Published:2015 Issue:32 Volume:7 Page:13489-13494
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Lim Namsoo,Pak Yusin,Kim Jin Tae,Hwang Youngkyu,Lee Ryeri,Kumaresan Yogeenth,Myoung NoSoung,Ko Heung Cho,Jung Gun Young

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2015/NR/C5NR02786A

Reference42 articles.

1. Ordered Metal Nanohole Arrays Made by a Two-Step Replication of Honeycomb Structures of Anodic Alumina

2. Nanometric superlattices: non-lithographic fabrication, materials, and prospects

3. Electrochemical synthesis and applications of oriented and hierarchically quasi-1D semiconducting nanostructures

4. Progress in Nano-Engineered Anodic Aluminum Oxide Membrane Development

5. Porous Anodic Aluminum Oxide: Anodization and Templated Synthesis of Functional Nanostructures

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