Rapid synthesis of nc-Si/a-SiNx:H QD thin films by plasma processing for their cost effective applications in photonic and photovoltaic devices-Reference-Cited by-同舟云学术

Rapid synthesis of nc-Si/a-SiNx:H QD thin films by plasma processing for their cost effective applications in photonic and photovoltaic devices

Published:2015 Issue:78 Volume:5 Page:63572-63579
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Das Debajyoti¹²³⁴⁵,Sain Basudeb¹²³⁴⁵

Affiliation:

1. Nano-Science Group

2. Energy Research Unit

3. Indian Association for the Cultivation of Science

4. Kolkata – 700 032

5. India

Abstract

A rapid and single step synthesis of nc-Si/a-SiN_x:H QD thin films has been made possible from a (SiH₄ + NH₃) gas mixture, with the advent of high density low pressure planar inductively coupled plasma processing.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C5RA10741E

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