Printed photonic elements: nanoimprinting and beyond-Reference-Cited by-同舟云学术

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Printed photonic elements: nanoimprinting and beyond

Published:2016 Issue:23 Volume:4 Page:5133-5153
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Zhang Cheng¹²³⁴,Subbaraman Harish⁵⁶⁷⁴,Li Qiaochu¹²³⁴,Pan Zeyu⁸⁹¹⁰⁷⁴,Ok Jong G.¹²³⁴,Ling Tao¹²³⁴,Chung Chi-Jui⁸⁹¹⁰⁷⁴,Zhang Xingyu⁸⁹¹⁰⁷⁴,Lin Xiaohui⁸⁹¹⁰⁷⁴,Chen Ray T.⁵⁶⁷⁴⁸,Guo L. Jay¹²³⁴

Affiliation:

1. Department of Electrical Engineering and Computer Science

2. University of Michigan

3. Ann Arbor

4. USA

5. Omega Optics, Inc.

6. 8500 Shoal Creek Blvd

7. Austin

8. Microelectronics Research Center

9. Department of Electrical and Computer Engineering

10. University of Texas at Austin

Abstract

In order to manufacture large-scale photonic devices of various dimensions at a low cost, a number of printing-based patterning techniques have been developed.

Funder

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/TC/C6TC01237J

Reference198 articles.

1. C. Mack , Introduction to Semiconductor Lithography, Fundamental Principles of Optical Lithography, John Wiley & Sons, Ltd, 2007, pp. 1–28

2. Pushing deep ultraviolet lithography to its limits

3. Extreme ultraviolet lithography: A review

4. X-ray lithography-an overview

5. Maskless Plasmonic Lithography at 22 nm Resolution

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