Tuning plasmonic properties of CuS thin films via valence band filling
Author:
Affiliation:
1. Department of Energy Systems Research
2. Ajou University
3. Suwon 443-739
4. Republic of Korea
5. Department of Materials Science and Engineering
Abstract
Tuning plasmonic properties of CuS thin films via electrochemical reduction by decreasing hole concentration in the valence band.
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2017/RA/C6RA27076J
Reference20 articles.
1. Plasmonics with Doped Quantum Dots
2. Plasmonics in heavily-doped semiconductor nanocrystals
3. Metallic-like Stoichiometric Copper Sulfide Nanocrystals: Phase- and Shape-Selective Synthesis, Near-Infrared Surface Plasmon Resonance Properties, and Their Modeling
4. CuS Nanodots with Ultrahigh Efficient Renal Clearance for Positron Emission Tomography Imaging and Image-Guided Photothermal Therapy
5. Copper Selenide Nanocrystals for Photothermal Therapy
Cited by 40 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Reduction of 4-Nitrophenol and Adsorption of Rhodamine B Using Reduced Graphene Oxide-Copper Sulfide Nanomaterial;Russian Journal of Physical Chemistry A;2024-09
2. Synthesis of CuS nanoparticles for enhance radiosensitization of cancer cells;Inorganic Chemistry Communications;2024-01
3. Synergy of copper vacancies and amorphous regions in copper sulfides enables superior capacity for Hg0 adsorption;Journal of Hazardous Materials;2024-01
4. Bio-recovery of CuS nanoparticles from the treatment of acid mine drainage with potential photocatalytic and antibacterial applications;Science of The Total Environment;2023-12
5. Electronic Properties of Transition and Alkaline Earth Metal Doped CuS: A DFT Study;ChemPhysChem;2023-10-04
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3