Contrasting mechanisms for photodissociation of methyl halides adsorbed on thin films of C6H6 and C6F6
Author:
Affiliation:
1. Department of Physics
2. University of Northern BC
3. 3333 University Way
4. Prince George B.C., V2N 4Z9
5. Canada
Abstract
Photodissociation of CH3X on C6F6 thin films on copper finds that dissociation by photoelectrons is entirely quenched. Different behaviour is observed for these molecules on C6H6 films, including a CT-complex pathway for CH3I on thick C6H6 films.
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2021/CP/D0CP05844K
Reference60 articles.
1. Extraterrestrial prebiotic molecules: photochemistryvs.radiation chemistry of interstellar ices
2. Precursors of Solvated Electrons in Radiobiological Physics and Chemistry
3. Charge Transfer on the Nanoscale: Current Status
4. Electronic structure and electron dynamics at molecule?metal interfaces: implications for molecule-based electronics
5. Methyl iodide A-band decomposition study by photofragment velocity imaging
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Binding energies of CD4 and fragment species to Pt(111): Implications for measurements of anion electron stimulated desorption;The Journal of Chemical Physics;2024-08-13
2. Adsorbate dissociation due to heteromolecular electronic energy transfer from fluorobenzene thin films;Physical Chemistry Chemical Physics;2024
3. Temperature-programmed desorption spectrometer combining minimum gas load, fast substrate replacement, and comprehensive temperature control;Chinese Journal of Chemical Physics;2023-08-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3