Gas-phase kinetic and mechanistic investigation of the OH radical and Cl atom oxidation of tetraethoxysilane-Reference-Cited by-同舟云学术

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Gas-phase kinetic and mechanistic investigation of the OH radical and Cl atom oxidation of tetraethoxysilane

Published:2016 Issue:102 Volume:6 Page:100577-100584
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Barnes Ian¹²³⁴⁵,Wiesen Peter¹²³⁴⁵

Affiliation:

1. University of Wuppertal

2. School of Mathematics and Natural Sciences

3. Institute for Atmospheric and Environmental Research

4. 42119 Wuppertal

5. Germany

Abstract

Kinetic and mechanistic study of the atmospherically relevant reactions of the OH-radical and Cl-atom with tetraethoxysilane.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA22473C

Reference45 articles.

1. L. Rösch , P.John and R.Reitmeier, Silicon Compounds, Organic, Ullmann's Encyclopedia of Industrial Chemistry, Wiley-VCH, Weinheim, 2002, 10.1002/14356007.a24_021

2. R. H. Perry and D.Green, Perry's Chemical Engineer's Handbook. Physical and Chemical Data, McGraw-Hill, New York, NY, 6th edn, 1984

3. Atmospheric processes

4. http://toxnet.nlm.nih.gov/cgi-bin/sis/search/r?dbs+hsdb:@term+@rn+@rel+78-10-4

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