Self-brushing for nanopatterning: achieving perpendicular domain orientation in block copolymer thin films-Reference-Cited by-同舟云学术

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Self-brushing for nanopatterning: achieving perpendicular domain orientation in block copolymer thin films

Published:2024 Issue:17 Volume:16 Page:8618-8626
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Feng Hongbo¹^ORCID,Chen Wen¹,Craig Gordon S. W.¹,Rowan Stuart J.¹²³^ORCID,Nealey Paul F.¹

Affiliation:

1. Pritzker School of Molecular Engineering, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, USA

2. Department of Chemistry, University of Chicago, 5735 S. Ellis Avenue, Chicago, Illinois 60637, USA

3. Center for Molecular Engineering, Argonne National Laboratory, 9700 S. Cass Avenue, Lemont, Illinois 60439, USA

Abstract

The self-brushing capability of block copolymers enables perpendicular thin film assembly on various substrates without the need for additional coatings.

Funder

Center for Hierarchical Materials Design

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/NR/D4NR00223G

Reference53 articles.

1. Form Follows Function: Nanoparticle Shape and Its Implications for Nanomedicine

2. J. W.Steed and J. L.Atwood , Supramolecular chemistry , John Wiley & Sons , 2022

3. Limits on fundamental limits to computation

4. Silicon Nitride and Related Materials

5. J. X. J.Zhang and K.Hoshino , in Molecular Sensors and Nanodevices , ed. J. X. J. Zhang and K. Hoshino , Academic Press , 2nd edn, 2019 , pp. 43–111 . 10.1016/B978-0-12-814862-4.00002-8

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