Cytosine monohydrate under mechanical stress-Reference-Cited by-同舟云学术

Cytosine monohydrate under mechanical stress

Published:2023 Issue:20 Volume:25 Page:3044-3050
ISSN:1466-8033
Container-title:CrystEngComm
language:en
Short-container-title:CrystEngComm

Author:

Fleming Megan E.¹,Hooks Daniel E.²³,McBride Michael²³,Li Nan³,Swift Jennifer A.¹^ORCID

Affiliation:

1. Georgetown University, Department of Chemistry, 37th and O Sts NW, Washington, DC 20057-1227, USA

2. Sigma Manufacturing Science, Los Alamos National Laboratory, Los Alamos, NM 87545, USA

3. Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, NM 87545, USA

Abstract

Cytosine monohydrate exhibits a highly anisotropic response to nanoindentation over a range of loads. Activation of low rugosity slip planes induces movement of π-stacks which propagate differently on opposite sides of the indent.

Funder

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2023/CE/D3CE00293D

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