Patterning submicron photomechanical features into single diarylethene crystals using electron beam lithography-Reference-Cited by-同舟云学术

Patterning submicron photomechanical features into single diarylethene crystals using electron beam lithography

Published:2022 Issue:9 Volume:7 Page:1065-1072
ISSN:2055-6756
Container-title:Nanoscale Horizons
language:en
Short-container-title:Nanoscale Horiz.

Author:

Li Wangxiang¹^ORCID,Kitagawa Daichi²^ORCID,Kobatake Seiya²^ORCID,Bekyarova Elena¹^ORCID,Bardeen Christopher J.¹^ORCID

Affiliation:

1. Department of Chemistry, University of California, Riverside, 501 Big Springs Road, Riverside, CA, 92521, USA

2. Department of Applied Chemistry, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi-ku, Osaka, 558-8585, Japan

Abstract

Electron beam lithography is used to pattern sub-micron structures into photomechanical organic single crystals. The patterned features exhibit up to 70% height changes when the bulk crystal undergoes reversible photoisomerization.

Funder

Office of Naval Research

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2022/NH/D2NH00205A

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4. High-resolution patterning of organic semiconductor single crystal arrays for high-integration organic field-effect transistors

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