A novel precursor towards buffer layer materials: the first solution based CVD of zinc oxysulfide-Reference-Cited by-同舟云学术

A novel precursor towards buffer layer materials: the first solution based CVD of zinc oxysulfide

Published:2020 Issue:16 Volume:8 Page:5501-5508
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Bhide Malavika A.¹²³⁴⁵^ORCID,Carmalt Claire J.¹²³⁴⁵^ORCID,Knapp Caroline E.¹²³⁴⁵^ORCID

Affiliation:

1. Materials Chemistry Centre

2. Department of Chemistry

3. University College London

4. London WC1H 0AJ

5. UK

Abstract

We report the first solution based deposition of zinc oxysulfide, Zn(O,S), thin films via aerosol-assisted chemical vapour deposition (AACVD) facilitated by the use of a specifically designed precursor: [Zn₈(SOCCH₃)₁₂S₂] (1).

Funder

Engineering and Physical Sciences Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/TC/D0TC00840K

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