A molecular dynamics investigation on the cross-linking and physical properties of epoxy-based materials
Author:
Affiliation:
1. Department of Architecture and Civil Engineering
2. City University of Hong Kong
3. Hong Kong, China
4. Department of Civil and Environmental Engineering
5. Massachusetts Institute of Technology
Abstract
This study presents a new development of a dynamic cross-linking algorithm which is capable of constructing a highly cross-linked network of SU-8 epoxy photoresist, and predicting the physical properties in good agreement with experimental measurements.
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2014/RA/C4RA04298K
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4. SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography
5. Effects of humidity on Young's modulus in poly(methyl methacrylate)
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