Fabrication of poly-crystalline Si-based Mie resonators via amorphous Si on SiO2dewetting-Reference-Cited by-同舟云学术

Fabrication of poly-crystalline Si-based Mie resonators via amorphous Si on SiO2dewetting

Published:2016 Issue:5 Volume:8 Page:2844-2849
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Naffouti Meher¹²³⁴⁵,David Thomas¹²³⁴⁵,Benkouider Abdelmalek¹²³⁴⁵,Favre Luc¹²³⁴⁵,Ronda Antoine¹²³⁴⁵,Berbezier Isabelle¹²³⁴⁵,Bidault Sebastien⁶⁷¹⁸,Bonod Nicolas¹²³⁹¹⁰,Abbarchi Marco¹²³⁴⁵

Affiliation:

1. CNRS

2. Aix-Marseille Université

3. Centrale Marseille

4. IM2NP

5. UMR 7334

6. ESPCI ParisTech

7. PSL Research University

8. F-75005 Paris, France

9. Institut Fresnel

10. UMR 7249

Abstract

High-quality Si-based polycrystalline Mie resonators are fabricated on arbitrary silica substratesviasolid-state dewetting.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2016/NR/C5NR07597A

Reference43 articles.

1. Optical response features of Si-nanoparticle arrays

2. Strong magnetic response of submicron Silicon particles in the infrared

3. Demonstration of Magnetic Dipole Resonances of Dielectric Nanospheres in the Visible Region

4. Broadband omnidirectional antireflection coating based on subwavelength surface Mie resonators

5. Magnetic light

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Self‐Assembly of Nanocrystalline Structures from Freestanding Oxide Membranes;Advanced Materials;2023-01-08

2. All-dielectric thermonanophotonics;Advances in Optics and Photonics;2021-09-20

3. Broadband Antireflection Coatings Made of Resonant Submicron- and Micron-Sized SiGe Particles Grown on Si Substrates;IEEE Photonics Journal;2021-06

4. Crystalline silicon nanoparticle formation by tailored plasma irradiation: self-structurization, nucleation and growth acceleration, and size control;Nanoscale;2021

5. Solid-State Dewetting Dynamics of Amorphous Ge Thin Films on Silicon Dioxide Substrates;Nanomaterials;2020-12-17