Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography-Reference-Cited by-同舟云学术

Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography

Published:2020 Issue:20 Volume:12 Page:11306-11316
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Dieleman Christian D.¹²³⁴^ORCID,Ding Weiyi¹²³⁴,Wu Lianjia⁵⁶⁷⁴^ORCID,Thakur Neha⁵⁶⁷⁴^ORCID,Bespalov Ivan⁵⁶⁷⁴,Daiber Benjamin¹²³⁴^ORCID,Ekinci Yasin⁸⁹¹⁰¹¹,Castellanos Sonia⁵⁶⁷⁴^ORCID,Ehrler Bruno¹²³⁴^ORCID

Affiliation:

1. AMOLF

2. Center for Nanophotonics

3. 1098XG Amsterdam

4. The Netherlands

5. Advanced Research Center for Nanolithography

6. EUV Photoresists Group

7. 1098 XG Amsterdam

8. Paul Scherrer Institute

9. Laboratory of Micro and Nanotechnology

10. 5232 Villigen

11. Switzerland

Abstract

A general, one-step patterning technique for colloidal quantum dots by direct optical or e-beam lithography. Photons (5.5–91.9 eV) and electrons (3 eV–50 kV) crosslink and immobilize QDs down to tens of nm while preserving the luminescent properties.

Funder

Seventh Framework Programme

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2020/NR/D0NR01077D

Reference56 articles.

1. 10.6% Certified Colloidal Quantum Dot Solar Cells via Solvent-Polarity-Engineered Halide Passivation

2. Highly Efficient Inverted Structural Quantum Dot Solar Cells

3. Enhancing Quantum Dot LED Efficiency by Tuning Electron Mobility in the ZnO Electron Transport Layer