Chemical exfoliation efficacy of semiconducting WS2 and its use in an additively manufactured heterostructure graphene–WS2–graphene photodiode-Reference-Cited by-同舟云学术

Chemical exfoliation efficacy of semiconducting WS2 and its use in an additively manufactured heterostructure graphene–WS2–graphene photodiode

Published:2019 Issue:44 Volume:9 Page:25805-25816
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Desai Jay A.¹²³⁴⁵,Adhikari Nirmal⁶³⁴⁵,Kaul Anupama B.⁷⁸⁵⁹⁶^ORCID

Affiliation:

1. Department of Metallurgical

2. Materials and Biomedical Engineering

3. University of Texas at El Paso

4. El Paso

5. USA

6. Department of Electrical Engineering

7. Department of Material Science and Engineering

8. Denton

9. PACCAR Technology Institute

Abstract

Among magnetic stirring (MS), shear mixing (SM), and horn-tip (HT) sonication for the chemical exfoliation of semiconducting WS₂, HT sonication resulted in stable dispersions which were used to demonstrate ink-jet printed graphene–WS₂–graphene photodiodes.

Funder

Army Research Office

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/RA/C9RA03644J

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