Well-defined triblock copolymers with a photolabile middle block of poly(phenyl vinyl ketone): facile synthesis, chain-scission mechanism and controllable photocleavability-Reference-Cited by-同舟云学术

Well-defined triblock copolymers with a photolabile middle block of poly(phenyl vinyl ketone): facile synthesis, chain-scission mechanism and controllable photocleavability

Published:2015 Issue:40 Volume:5 Page:31365-31374
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Guo Ruiwei¹²³⁴⁵,Mei Pengbo¹²³⁴⁵,Zhong Qing¹²³⁴⁵,Yao Yuan¹²³⁴⁵,Su Qian¹²³⁴⁵,Zhang Jianhua¹²³⁴⁵

Affiliation:

1. Department of Polymer Science and Engineering

2. School of Chemical Engineering and Technology

3. Tianjin University

4. Tianjin

5. China

Abstract

Well-defined triblock copolymers with a photocleavable middle block were synthesized by RAFT polymerization and the photodegradation process was tracked by GPEC.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C5RA02863A

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