Effect of a single water molecule on ˙CH2OH + 3O2 reaction under atmospheric and combustion conditions
Author:
Affiliation:
1. Department of Chemistry, National Institute of Technology, Raipur 492010, India
2. Department of Chemistry, College of Science, King Faisal University, P.O. Box 380, Al Hufuf 31982, Al-Ahsa, Saudi Arabia
Abstract
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2022/CP/D1CP03911C
Reference68 articles.
1. Atmospheric Degradation of Volatile Organic Compounds
2. Comprehensive Mechanism for Methanol Oxidation
3. Shock tube study on homogeneous thermal oxidation of methanol
4. A comprehensive mechanism for methanol oxidation
5. A dimensionally reduced reaction mechanism for methanol oxidation
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Optimization of a methanol/NOx combustion mechanism based on a large amount of experimental data;Fuel;2024-11
2. Combined Experimental and Theoretical Investigation of the Electrochemical Behavior of Hydroxy‐Substituted Anils;ChemistrySelect;2024-08-06
3. Unveiling the chemical kinetics of aminomethanol (NH2CH2OH): insights into O.H and O2 photo-oxidation reactions and formamide dominance;Frontiers in Chemistry;2024-05-30
4. Can a single ammonia and water molecule enhance the formation of methanimine under tropospheric conditions?: kinetics of •CH2NH2 + O2 (+NH3/H2O);Frontiers in Chemistry;2023-09-21
5. Synthesis and characterization of tailor-made o-hydroxysubstituted anils through 1H NMR, 13C NMR, SC-XRD and DFT studies for possible optoelectronic applications;Molecular Physics;2023-06-26
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3